The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 05, 2017

Filed:

Oct. 21, 2015
Applicant:

Raytheon Company, Waltham, MA (US);

Inventors:

Keith A. Kerns, Tucson, AZ (US);

Wayne Y. Lee, Tucson, AZ (US);

John J. Spilotro, Tucson, AZ (US);

Assignee:

Raytheon Company, Waltham, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F42B 12/02 (2006.01); F41H 5/00 (2006.01); F42D 5/045 (2006.01); F16F 7/12 (2006.01);
U.S. Cl.
CPC ...
F42D 5/045 (2013.01); F16F 7/12 (2013.01);
Abstract

A shock attenuation device is used to reduce the effect of a blast shock by both disrupting the propagation of the shock and by spreading, deflecting, and/or redirecting the shock. The device includes multiple layers of different materials, having different shock transmission impedances, stacked in a direction in which the blast shock travels through the device. At least one of the layers includes a material that crumples in response to the shock, undergoing an inelastic deformation in response to the shock. Also, at least one of the layers includes a material that has a directional shock transmission impedance that provides different shock transmission impedance within different directions within the material. The directional shock transmission material may be oriented such that the preferred direction of shock transmission within the material is oriented away from the direction of in which the multiple layers of material are stacked.


Find Patent Forward Citations

Loading…