The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 05, 2017
Filed:
Mar. 28, 2016
Applicant:
Jx Nippon Mining & Metals Corporation, Tokyo, JP;
Inventor:
Yohei Yamaguchi, Kitaibaraki, JP;
Assignee:
JX NIPPON MINING & METALS CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/34 (2006.01); C23C 14/08 (2006.01); H01J 37/34 (2006.01); C04B 35/457 (2006.01); C04B 35/453 (2006.01); C04B 35/01 (2006.01);
U.S. Cl.
CPC ...
C23C 14/3414 (2013.01); C04B 35/01 (2013.01); C04B 35/453 (2013.01); C04B 35/457 (2013.01); C23C 14/086 (2013.01); C23C 14/3407 (2013.01); H01J 37/3423 (2013.01); H01J 37/3426 (2013.01); H01J 37/3491 (2013.01); C04B 2235/3284 (2013.01); C04B 2235/3293 (2013.01); C04B 2235/5409 (2013.01); C04B 2235/604 (2013.01); C04B 2235/608 (2013.01); C04B 2235/6562 (2013.01); C04B 2235/6567 (2013.01); C04B 2235/6585 (2013.01); C04B 2235/77 (2013.01); C04B 2235/94 (2013.01); C04B 2235/963 (2013.01);
Abstract
A cylindrical sputtering target includes a plurality of cylindrical sintered compacts adjacent to each other while having a space therebetween. The plurality of cylindrical sintered compacts have a relative density of 99.7% or higher and 99.9% or lower. The plurality of cylindrical sintered compacts adjacent to each other have a difference therebetween in the relative density of 0.1% or smaller.