The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 05, 2017

Filed:

Aug. 17, 2015
Applicant:

Board of Regents, the University of Texas System, Austin, TX (US);

Inventors:

Christopher J. Ellison, Austin, TX (US);

Carlton Grant Willson, Austin, TX (US);

Julia Cushen, Austin, TX (US);

Christopher M. Bates, Austin, TX (US);

Attorney:
Int. Cl.
CPC ...
C09D 167/00 (2006.01); B05D 1/00 (2006.01); B05D 3/00 (2006.01); B05D 5/00 (2006.01); C08G 63/695 (2006.01); B05C 21/00 (2006.01); C08F 112/14 (2006.01); G03F 7/00 (2006.01); B82Y 10/00 (2011.01); B82Y 40/00 (2011.01); C08F 8/02 (2006.01);
U.S. Cl.
CPC ...
C09D 167/00 (2013.01); B05C 21/005 (2013.01); B05D 1/005 (2013.01); B05D 3/00 (2013.01); B05D 5/00 (2013.01); B82Y 10/00 (2013.01); B82Y 40/00 (2013.01); C08F 8/02 (2013.01); C08F 112/14 (2013.01); C08G 63/6952 (2013.01); G03F 7/0002 (2013.01); C08F 2810/40 (2013.01); Y10T 428/24851 (2015.01); Y10T 428/31504 (2015.04);
Abstract

The present invention includes a diblock copolymer system that self-assembles at very low molecular weights to form very small features. In one embodiment, one polymer in the block copolymer contains silicon, and the other polymer is a polylactide. In one embodiment, the block copolymer is synthesized by a combination of anionic and ring opening polymerization reactions. In one embodiment, the purpose of this block copolymer is to form nanoporous materials that can be used as etch masks in lithographic patterning.


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