The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 28, 2017

Filed:

Mar. 02, 2016
Applicant:

Commissariat a L'energie Atomique ET Aux Energies Alternatives, Paris, FR;

Inventors:

Julien Borrel, Seyssinet, FR;

Louis Hutin, Saint Martin le Vinoux, FR;

Yves Morand, Grenoble, FR;

Fabrice Nemouchi, Moirans, FR;

Heimanu Niebojewski, Grenoble, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/66 (2006.01); H01L 29/08 (2006.01); H01L 21/768 (2006.01); H01L 23/535 (2006.01); H01L 29/423 (2006.01); H01L 29/51 (2006.01); H01L 29/772 (2006.01);
U.S. Cl.
CPC ...
H01L 29/66553 (2013.01); H01L 21/76897 (2013.01); H01L 23/535 (2013.01); H01L 29/0895 (2013.01); H01L 29/42364 (2013.01); H01L 29/512 (2013.01); H01L 29/772 (2013.01);
Abstract

A field-effect transistor, including a source, drain and channel formed in a semiconductor layer a gate stack placed above the channel, including a metal electrode, a first layer of electrical insulator placed between the metal electrode and the channel, and a second layer of electrical insulator covering the metal electrode; a metal contact placed plumb with the source or drain and at least partially plumb with said gate stack; and a third layer of electrical insulator placed between said metal contact and said source or said drain.


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