The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 28, 2017
Filed:
Jun. 09, 2016
Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Il-Suk Park, Hwaseong-si, KR;
Hyung-Suk Cho, Hwaseong-si, KR;
Samsung Electronics Co., Ltd., Gyeonggi-do, KR;
Abstract
The defect imaging apparatus including a chamber having a stage to which a substrate having at least one process defect and at least one reference defects defined at a given area is secured, a position controller configured to obtain an imaging error from a detected actual position and a conversion position of the reference defect and correct a conversion position of the process defect by the imaging error, and generate an irradiation position corresponding to an actual position of the process defect, an image signal generator configured to generate an image signal of the process defect by irradiating an electron beam to the irradiation position and detecting charged particles from the irradiation position in response to the irradiated electron beam, and an imaging device configured to generate a defect image of the process defect by processing the generated image signal may be provided.