The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 28, 2017

Filed:

Jan. 30, 2015
Applicants:

Fu Tai Hua Industry (Shenzhen) Co., Ltd., Shenzhen, CN;

Hon Hai Precision Industry Co., Ltd., New Taipei, TW;

Inventors:

Xin-Yuan Wu, Shenzhen, CN;

Peng Xie, Shenzhen, CN;

Lu Yang, Shenzhen, CN;

Chih-Kuang Chang, New Taipei, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); G06T 5/00 (2006.01); G06T 17/20 (2006.01);
U.S. Cl.
CPC ...
G06T 5/002 (2013.01); G06T 17/205 (2013.01); G06T 2210/56 (2013.01);
Abstract

A method for simplifying a mesh point cloud includes following steps: obtaining a point cloud and meshing the point cloud so that the point cloud is formed with a plurality of triangular grids; calculating a distance between a vertex of the triangular grid and its corresponding normal plane to determine an influence of the vertex to a geometric characteristic of the mesh point cloud; deleting the vertexes and the grids in connection therewith in accordance with a predetermined degree of simplification, wherein the deleted vertexes are those which have less influence to the geometric characteristic of the mesh point cloud; creating triangular grids to fill the void part in accordance with Delaunay triangulation; and smoothening the created grids.


Find Patent Forward Citations

Loading…