The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 28, 2017
Filed:
Dec. 29, 2016
Nikon Corporation, Tokyo, JP;
Kazuya Ono, Saitama, JP;
NIKON CORPORATION, Tokyo, JP;
Abstract
An exposure apparatus includes a projection system, a liquid supply system having a supply opening via which liquid is supplied to a space under the projection system, a liquid recovery system having a recovery opening via which the supplied liquid is collected, a supply flow meter fluidically connected to the supply opening, a stage system having a movable stage apparatus on which a substrate is held, and a measurement system which measures a wavefront aberration and has a light receiving part which receives a light from the projection system through a light-transmissive member provided at the movable stage apparatus and the liquid between the projection system and the light-transmissive member. A liquid immersion area, through which the substrate is exposed, is formed on a portion of an upper surface of the substrate while performing liquid supply via the supply opening and liquid collection via the recovery opening.