The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 28, 2017
Filed:
Mar. 15, 2013
Applicant:
Palo Alto Research Center Incorporated, Palo Alto, CA (US);
Inventors:
Kai Melde, San Francisco, CA (US);
Philipp H. Schmaelzle, Los Altos, CA (US);
Assignee:
Palo Alto Research Center Incorporated, Palo Alto, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/54 (2006.01); G03F 7/20 (2006.01); G03F 7/24 (2006.01); B81C 99/00 (2010.01); G03F 1/50 (2012.01); G03F 7/16 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70141 (2013.01); B81C 99/0095 (2013.01); G03F 1/50 (2013.01); G03F 7/16 (2013.01); G03F 7/2012 (2013.01); G03F 7/24 (2013.01);
Abstract
A continuous flow projection lithography system to form microstructures using an optical array incorporated in a continuous coating process is provided. A mask is placed at a distance from the array. Each element of the array projects one image of the mask onto a substrate, effectively forming an array thereon. A coating process allows flows that can be used to define functional regions of particles or supporting layers that prevent adhesion of crosslinked polymers to surfaces.