The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9828677 B1

PDF
Full Text
Expired
Date of Patent:
Nov. 28, 2017

Filed:

Jan. 14, 2015
Applicant:

National Institute of Standards and Technology, Gaithersburg, MD (US);

Inventor:

Owen Hildreth, Pacific Grove, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/306 (2006.01); C23C 18/16 (2006.01); C23C 18/18 (2006.01); C23C 18/31 (2006.01); H01L 21/285 (2006.01); H01Q 17/00 (2006.01); C25F 3/12 (2006.01);
U.S. Cl.
CPC ...
C23C 18/1608 (2013.01); C23C 18/1879 (2013.01); C23C 18/31 (2013.01); C25F 3/12 (2013.01); H01L 21/28506 (2013.01); H01L 21/306 (2013.01); H01Q 17/00 (2013.01);
Abstract

A process for etching includes disposing an activating catalyst on a substrate; providing a vapor composition that includes an etchant oxidizer, an activatable etchant, or a combination thereof; contacting the activating catalyst with the etchant oxidizer; contacting the substrate with the activatable etchant; performing an oxidation-reduction reaction between the substrate, the activatable etchant, and the etchant oxidizer in a presence of the activating catalyst and the vapor composition; forming an etchant product that includes a plurality of atoms from the substrate; and removing the etchant product from the substrate to etch the substrate.


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Hildreth, Owen. (2017). Article and process for selective etching (U.S. Patent No. 9828677). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9828677

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