The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 28, 2017
Filed:
May. 21, 2014
Low density ethylene-based polymer compositions with high melt strength and mid-high density control
Dow Global Technologies Llc, Midland, MI (US);
Cornelis F. J. den Doelder, Terneuzen, NL;
Karl Zuercher, Samstagern, CH;
Otto J. Berbee, Hulst, NL;
Jian Wang, Freeport, TX (US);
Teresa P. Karjala, Lake Jackson, TX (US);
Dow Global Technologies LLC, Midland, MI (US);
Abstract
The invention provides a composition comprising a first ethylene-based polymer, formed by a high pressure, free-radical polymerization process, and a second ethylene-based polymer, formed by a high pressure, free-radical polymerization process, such composition comprising the following properties: a) a melt index (12) from 2.0 to 10 dg/min; b) a density from 0.922 to 0.935 g/cc; and wherein the second ethylene-based polymer is present in an amount from 60 to 95 weight percent, based on the sum of the weight of the first polymer and the second polymer; and wherein the second ethylene-based polymer has a density greater than, or equal to, 0.924 g/cc; and wherein the first ethylene-based polymer has a melt index less than 2.5 dg/min.