The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 28, 2017
Filed:
Apr. 17, 2014
Mitsubishi Gas Chemical Company, Inc., Tokyo, JP;
Mitsubishi Gas Chemical Company, Inc., Tokyo, JP;
Abstract
The invention provides a polyamide resin composition (1) containing a polyamide (A) and a free volume modifier (B), and having a free volume, as measured according to a positron annihilation method, of 0.0545 nmor less. The invention also provides a polyamide resin composition (2) prepared by adding from 0.005 to 1.200 parts by mass of a polysilsesquioxane (B) whose main chain is comprised of siloxane bonds, to 100 parts by mass of a polyamide (A) that contains a diamine unit including an aromatic diamine unit represented by the following general formula (I) in an amount of 70 mol % or more and a dicarboxylic acid unit including at least one of a linear aliphatic dicarboxylic acid unit represented by the following general formula (II-1) and an aromatic dicarboxylic acid unit represented by the following general formula (II-2) in a total amount of 50 mol % or more: wherein n in the general formula (II-1) indicates an integer of from 2 to 18, and Ar in the general formula (II-2) represents an arylene group.