The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 28, 2017
Filed:
Sep. 16, 2015
SK Hynix Inc., Gyeonggi-do, KR;
Soulbrain Sigma-aldrich, Ltd, Chungcheongnam-do, KR;
Ji-Won Moon, Gyeonggi-do, KR;
Young-Jin Son, Gyeonggi-do, KR;
Jeong-Yeop Lee, Gyeonggi-do, KR;
Jun-Soo Jang, Gyeonggi-do, KR;
Jae-Sun Jung, Chungcheongnam-do, KR;
Sang-Kyung Lee, Chungcheongnam-do, KR;
Chang-Sung Hong, Chungcheongnam-do, KR;
Hyun-Joon Kim, Chungcheongnam-do, KR;
Jin-Ho Shin, Chungcheongnam-do, KR;
Dae-Hyun Kim, Chungcheongnam-do, KR;
SK Hynix Inc., Gyeonggi-do, KR;
SOULBRAIN SIGMA-ALDRICH, LTD, Chungcheongnam-do, KR;
Abstract
A film-forming composition including a 3-intracyclic cyclopentadienyl precursor and dimethyethylamine is useful for Atomic Layer Deposition, and improves viscosity and volatility while maintaining unique features of metal precursors.