The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 28, 2017
Filed:
Aug. 28, 2014
Applicant:
Infineon Technologies Ag, Neubiberg, DE;
Inventors:
Friedrich Kroener, Villach, AT;
Zeljka Kroener, Villach, AT;
Assignee:
INFINEON TECHNOLOGIES AG, Neubiberg, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C02F 1/52 (2006.01); C02F 101/10 (2006.01); C02F 103/34 (2006.01); C02F 1/72 (2006.01);
U.S. Cl.
CPC ...
C02F 1/5236 (2013.01); C02F 1/72 (2013.01); C02F 2101/10 (2013.01); C02F 2101/103 (2013.01); C02F 2103/346 (2013.01); C02F 2209/02 (2013.01); C02F 2305/02 (2013.01);
Abstract
A method of removing particulate silicon from an effluent water in accordance with various embodiments may include: adding a base to the effluent water, an amount of the added base being sub-stoichiometric with regard to a basic oxidation reaction of an entire amount of silicon contained in the effluent water to ortho-silicic acid or ortho-silicate ions; maintaining a resulting mixture of the effluent water and the base in a predetermined temperature range for a period of time, so that a sediment including silicon is formed; and separating the sediment and the effluent water from each other.