The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 21, 2017
Filed:
May. 22, 2015
Ushio Denki Kabushiki Kaisha, Tokyo, JP;
Takuma Yokoyama, Tokyo, JP;
USHIO DENKI KABUSHIKI KAISHA, Tokyo, JP;
Abstract
An extreme ultraviolet light source device that can stably and efficiently provide EUV emission. The EUV light source device includes a first laser source that irradiates a high-temperature plasma raw material with a laser beam, and a second laser source that, after the high-temperature plasma raw material is irradiated with the laser beam and before effective extreme ultraviolet light is emitted, irradiates the raw material in that region which is irradiated with the laser beam, with a second laser beam. The EUV light source device also includes a return light blocking unit that prevents return light of the laser beam, which is emitted from the first laser source, from reaching a light emission opening of the second laser source.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile