The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 21, 2017
Filed:
Sep. 23, 2016
Aryan Hazeghi, San Jose, CA (US);
Carlo Dal Mutto, Sunnyvale, CA (US);
Giulio Marin, Sunnyvale, CA (US);
Francesco Peruch, Sunnyvale, CA (US);
Michele Stoppa, Sunnyvale, CA (US);
Abbas Rafii, Palo Alto, CA (US);
Aryan Hazeghi, San Jose, CA (US);
Carlo Dal Mutto, Sunnyvale, CA (US);
Giulio Marin, Sunnyvale, CA (US);
Francesco Peruch, Sunnyvale, CA (US);
Michele Stoppa, Sunnyvale, CA (US);
Abbas Rafii, Palo Alto, CA (US);
AQUIFI, INC., Palo Alto, CA (US);
Abstract
A pattern projection system includes a coherent light source, a repositionable DOE disposed to receive coherent light from said coherent light source and disposed to output at least one pattern of projectable light onto a scene to be imaged by an (x,y) two-dimensional optical acquisition system. Coherent light speckle artifacts in the projected pattern are reduced by rapidly controllably repositioning the DOE or the entire pattern projection system. Different projectable patterns are selected from a set of M patterns that are related to each other by a translation and/or rotation operation in two-dimensional cosine space. A resultant (x,y,z) depth map has improved quality and robustness due to projection of the selected patterns. Three-dimensional (x,y,z) depth data obtained from two-dimensional imaged data including despeckling is higher quality data than if projected patterns without despeckling were used.