The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 21, 2017

Filed:

Dec. 31, 2014
Applicant:

Kuang-chi Innovative Technology Ltd., ShenZhen, CN;

Inventors:

Ruopeng Liu, ShenZhen, CN;

Chunlin Ji, ShenZhen, CN;

Yutao Yue, ShenZhen, CN;

Yuqing Liu, ShenZhen, CN;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01Q 15/14 (2006.01); H01Q 15/00 (2006.01); H01Q 15/16 (2006.01); H01Q 19/12 (2006.01);
U.S. Cl.
CPC ...
H01Q 15/148 (2013.01); H01Q 15/0053 (2013.01); H01Q 15/145 (2013.01); H01Q 15/16 (2013.01); H01Q 19/12 (2013.01);
Abstract

The disclosure relates to an antenna reflector phase correction film and a reflector antenna. The antenna reflector phase correction film includes a first substrate, a second substrate, and multiple artificial microstructures disposed between the first substrate and the second substrate, the artificial microstructures are wires made of electrically conductive materials, and an electromagnetic wave, emergent after being reflected by an antenna reflector attached with the antenna reflector phase correction film, has an equiphase surface. According to the disclosure, the antenna reflector phase correction film has specific refractive index distribution internally, so that a surface emergent phase of a reflector can be corrected after attaching onto a surface of a conventional reflector, a phase error caused due to installation or processing is improved, a complete flat emergent equiphase is obtained, and then a far-field performance (such as a higher gain) is improved.


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