The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 21, 2017
Filed:
Feb. 27, 2013
Applicant:
Chugai RO Co., Ltd., Osaka-shi, Osaka, JP;
Inventor:
Eiji Furuya, Osaka, JP;
Assignee:
CHUGAI RO CO., LTD., Osaka-Shi, Osaka, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/34 (2006.01); C23C 14/32 (2006.01); H05H 1/46 (2006.01); H01J 37/32 (2006.01); C23C 14/35 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3411 (2013.01); C23C 14/32 (2013.01); C23C 14/35 (2013.01); H01J 37/32055 (2013.01); H01J 37/3266 (2013.01); H01J 37/3458 (2013.01); H05H 1/46 (2013.01);
Abstract
Provided is a plasma generation apparatus capable of generating uniform plasma over a wide range. The plasma generation apparatus includes two oppositely arranged plasma guns each injecting a discharge gas to be ionized, and having a cathode for emitting electrons, and a converging coil for forming a magnetic flux to guide the emitted electrons, and polarities of the converging coils with respect to the cathodes in the two plasma guns are opposite to each other.