The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 21, 2017
Filed:
May. 08, 2013
Applicant:
Cheil Industries Inc., Gumi-si, Gyeongsangbuk-do, KR;
Inventors:
Yong-Woon Yoon, Suwon-si, KR;
Sung-Jae Lee, Suwon-si, KR;
Joon-Young Moon, Suwon-si, KR;
You-Jung Park, Suwon-si, KR;
Chul-Ho Lee, Suwon-si, KR;
Youn-Jin Cho, Suwon-si, KR;
Assignee:
CHEIL INDUSTRIES, INC., Gumi-Si, Gyeongsangbuk-Do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/11 (2006.01); C07D 303/32 (2006.01); C09D 163/00 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); C07D 303/14 (2006.01); C09D 5/00 (2006.01); C09D 7/12 (2006.01); G03F 7/34 (2006.01);
U.S. Cl.
CPC ...
G03F 7/11 (2013.01); C07D 303/14 (2013.01); C07D 303/32 (2013.01); C09D 5/00 (2013.01); C09D 7/1233 (2013.01); C09D 163/00 (2013.01); G03F 7/20 (2013.01); G03F 7/32 (2013.01); G03F 7/34 (2013.01);
Abstract
Disclosed are a monomer for a hardmask composition represented by the following Chemical Formula 1, a hardmask composition including the monomer, and a method of forming patterns using the hardmask composition.