The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 21, 2017
Filed:
Aug. 01, 2016
Applicant:
Toray Industries, Inc., Tokyo, JP;
Inventors:
Daichi Miyazaki, Otsu, JP;
Masao Tomikawa, Otsu, JP;
Assignee:
TORAY INDUSTRIES, INC., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08L 77/00 (2006.01); D21H 17/55 (2006.01); C08F 8/00 (2006.01); C08L 83/00 (2006.01); C08G 69/26 (2006.01); C09D 179/08 (2006.01); C08G 73/10 (2006.01); C08G 69/44 (2006.01);
U.S. Cl.
CPC ...
C09D 179/08 (2013.01); C08G 69/44 (2013.01); C08G 73/101 (2013.01); C08G 73/1007 (2013.01); C08G 73/1067 (2013.01); C08G 73/1071 (2013.01); C08G 73/1075 (2013.01); C08G 73/1082 (2013.01); C08G 2150/00 (2013.01);
Abstract
A polyamic acid useful for forming a protective or insulative layer for semiconductor elements has a structure represented by chemical formula (1): wherein δ represents an oxygen or sulfur atom; W represents an electron-withdrawing group; and Rand Rrepresent independently a hydrogen atom or a hydrocarbon group having 1 to 10 carbon atoms.