The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 14, 2017
Filed:
Feb. 25, 2014
University of Florida Research Foundation, Incorporated, Gainesville, FL (US);
Subrata Roy, Gainesville, FL (US);
University of Florida Research Foundation, Incorporated, Gainesville, FL (US);
Abstract
Embodiments of the invention relate to a method and apparatus for providing high thrust density plasma, and/or high control authority plasma. In specific embodiments, such high thrust density, and/or high control authority, plasma can be at or near atmospheric pressure. Embodiments pertain to a method and apparatus that use electron confinement via one or more magnetic fields, and/or one or more electric fields, in a manner to improve the ionization due to surface plasma actuators. Specific embodiments can improve ionization by several orders of magnitude. This improved ionization can result in a high electric field inside the sheath for the same applied voltage and can result in very high thrust.