The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 14, 2017

Filed:

Feb. 07, 2017
Applicant:

Nokia Solutions and Networks Oy, Espoo, FI;

Inventors:

Mieszko Chmiel, Wroclaw, PL;

Hans Kroener, Geislingen-Weiler, DE;

Robert Buranyi, Budaors, HU;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H04W 72/12 (2009.01);
U.S. Cl.
CPC ...
H04W 72/1205 (2013.01); H04W 72/12 (2013.01);
Abstract

In a first aspect, requests for carrier aggregation scheduling for a user equipment are received (S) from a first cell used for carrier aggregation for the user equipment in a cellular communications network and n second cells of the cellular communications network, used for the carrier aggregation. The requests include a first scheduling decision of the first cell and n second scheduling decisions of the n second cells. It is checked (S) whether or not the requests exceed limits of the user equipment, and the n second scheduling decisions are modified (S) according to predefined rules such that the requests do not exceed the limits of the user equipment. In a second aspect, limits of the user equipment are increased by a margin (S), the increased limits are split onto active cells of the first and n second cells according to a predefined rule (S), and the margin is controlled (S) dependent on whether the increased and split limits are exceeded or not by the requests (S). If they are exceeded, the n second scheduling decisions may be modified according to the first aspect (S).


Find Patent Forward Citations

Loading…