The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 14, 2017

Filed:

Oct. 19, 2016
Applicants:

The Regents of the University of California, Oakland, CA (US);

Radiabeam Technologies, Llc, Santa Monica, CA (US);

Inventors:

Pietro Musumeci, Los Angeles, CA (US);

Joseph Duris, Los Angeles, CA (US);

Alex Murokh, Encino, CA (US);

Assignees:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01S 3/09 (2006.01); H01S 3/0955 (2006.01); H01S 3/0959 (2006.01);
U.S. Cl.
CPC ...
H01S 3/0903 (2013.01); H01S 3/0955 (2013.01); H01S 3/0959 (2013.01);
Abstract

A tapering enhanced stimulated superradiant amplification method and system which utilizes a strongly tapered undulator in reaching significant power outputs and conversion efficiencies. TESSA dramatically increases conversion/amplification efficiencies by violently (sharply) decelerating electrons and taking advantage of produced radiation to further drive interaction toward as it takes advantage of produced radiation to further drive interaction to increase overall radiation output. The system and method configures a strongly tapered undulator to operate in a new mode that is above normal input saturation levels to provide an amplified output with unexpectedly high efficiencies and power.


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