The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 14, 2017

Filed:

Apr. 15, 2015
Applicant:

Sumitomo Chemical Company, Limited, Tokyo, JP;

Inventors:

Sho Kanesaka, Tsukuba, JP;

Hidekazu Yoshida, Osaka, JP;

Tomoya Kashiki, Tsukuba, JP;

Takayuki Okachi, Tsukuba, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 35/24 (2006.01); H01L 51/00 (2006.01); C08K 5/45 (2006.01); C08K 5/54 (2006.01); C08L 65/00 (2006.01); H01L 29/80 (2006.01); H01L 51/05 (2006.01); C09D 5/24 (2006.01); C09D 7/12 (2006.01); C09D 165/00 (2006.01);
U.S. Cl.
CPC ...
H01L 51/0036 (2013.01); C08K 5/45 (2013.01); C08K 5/54 (2013.01); C08L 65/00 (2013.01); C09D 5/24 (2013.01); C09D 7/1233 (2013.01); C09D 165/00 (2013.01); H01L 29/80 (2013.01); H01L 51/0074 (2013.01); H01L 51/05 (2013.01); C08G 2261/124 (2013.01); C08G 2261/1412 (2013.01); C08G 2261/3246 (2013.01); C08G 2261/411 (2013.01); C08G 2261/92 (2013.01); C08K 2201/001 (2013.01); H01L 51/057 (2013.01); H01L 51/0541 (2013.01); H01L 51/0545 (2013.01); H01L 51/0554 (2013.01); H01L 51/0566 (2013.01);
Abstract

A film comprising a polymer compound and a low molecular weight compound having carrier transportability, wherein the content of the low molecular weight compound is 5 to 40 parts by mass with respect to 100 parts by mass of the sum of the polymer compound and the low molecular weight compound, the diffraction intensity A specified by the following measuring method A is 3 to 50, and the intensity ratio (A/B) of the diffraction intensity A specified by the following measuring method A to the diffraction intensity B specified by the following measuring method B is 30 or less: (Measuring method A) the diffraction intensity A is the maximum diffraction intensity in a range of scattering vector of 1 nmto 5 nmin a profile obtained by an Out-of plane measuring method using a film X-ray diffraction method; (Measuring method B) the diffraction intensity B is the maximum diffraction intensity in a range of scattering vector of 10 nmto 21 nmin a profile obtained by an In-plane measuring method using a film X-ray diffraction method.


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