The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 14, 2017
Filed:
Nov. 03, 2016
SK Hynix Inc., Icheon-Si, KR;
Sang-Soo Kim, Icheon-si, KR;
SK hynix Inc., Icheon-Si, KR;
Abstract
A method for fabricating a semiconductor device includes: forming an inter-layer dielectric layer and a sacrificial layer over a substrate so that the sacrificial layer covers the inter-layer dielectric layer; forming a conductive pattern that is coupled with a portion of the substrate while penetrating through the inter-layer dielectric layer and the sacrificial layer; protruding a first portion of the conductive pattern by removing the sacrificial layer while maintaining a second portion of the conductive pattern inside the inter-layer dielectric layer; oxidizing the protruded first portion of the conductive pattern without oxidizing the second portion of the conductive pattern; removing the oxidized first portion of the conductive pattern to expose a top of the second portion of the conductive pattern; and forming a variable resistance element on top of the conductive pattern to couple a bottom of the variable resistance element with the top of the second portion of the conductive pattern.