The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 14, 2017

Filed:

Jul. 24, 2014
Applicants:

National Institute of Advanced Industrial Science and Technology, Tokyo, JP;

Wacom R&d Corporation, Tokyo, JP;

Inventors:

Shigeki Sakai, Ibaraki, JP;

Mitsue Takahashi, Ibaraki, JP;

Masaki Kusuhara, Tokyo, JP;

Masayuki Toda, Tokyo, JP;

Masaru Umeda, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/78 (2006.01); C23C 16/40 (2006.01); H01L 21/28 (2006.01); H01L 29/51 (2006.01); H01L 29/66 (2006.01); H01L 21/02 (2006.01); H01L 27/1159 (2017.01);
U.S. Cl.
CPC ...
H01L 29/78391 (2014.09); C23C 16/40 (2013.01); H01L 21/02197 (2013.01); H01L 21/02271 (2013.01); H01L 21/28291 (2013.01); H01L 29/516 (2013.01); H01L 29/6684 (2013.01); H01L 27/1159 (2013.01);
Abstract

A ferroelectric device and a manufacturing method are provided. While holding a nonvolatile memory retention capability and a multiple rewriting endurance as the distinctive features of a ferroelectric device, the disclosed ferroelectric device is wider in memory window and more adaptively made microfiner than a conventional ferroelectric device that has used a ferroelectric mainly constituted of Sr—Bi—Ta—O as an oxide of strontium, bismuth and tantalum. Directly on or with intermediary of an insulator on a semiconductor there are layered a first ferroelectric and a conductor to form a gate stack, the first ferroelectric being mainly constituted of Sr—Ca—Bi—Ta—O as an oxide of strontium, calcium, bismuth and tantalum and being built up by a metal organic vapor deposition technique from a suitable film-forming raw material. The gate stack is heat-treated to cause the first ferroelectric to develop its ferroelectricity.


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