The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 14, 2017

Filed:

Jul. 08, 2015
Applicants:

Boe Technology Group Co., Ltd., Beijing, CN;

Hefei Boe Optoelectronics Technology Co., Ltd., Anhui, CN;

Inventor:

Qiyu Shen, Beijing, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/32 (2006.01); H01L 21/77 (2017.01); H01L 27/12 (2006.01);
U.S. Cl.
CPC ...
H01L 27/3258 (2013.01); H01L 21/77 (2013.01); H01L 27/3246 (2013.01); H01L 27/3248 (2013.01); H01L 27/1248 (2013.01); H01L 27/1288 (2013.01); H01L 2227/323 (2013.01);
Abstract

Embodiments of the present application provide a method for producing an array substrate. The array substrate includes a planarization layer provided on a layer of thin film transistors and a first electrode provided on the planarization layer for a light emitting device. The method includes the steps of: forming a pixel definition layer for placing the first electrode, a via hole for the first electrode and a spacer on the planarization layer by a single patterning process with a single mask. The array substrate is produced by the method provided by the present embodiment, so that the number of the used patterning processes and the number of the used masks are reduced.


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