The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 14, 2017

Filed:

Jun. 11, 2013
Applicant:

Kobe Steel, Ltd., Kobe-shi, JP;

Inventors:

Shinichi Tanifuji, Kobe, JP;

Kenji Yamamoto, Kobe, JP;

Assignee:

Kobe Steel, Ltd., Kobe-shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/34 (2006.01); H01J 37/34 (2006.01); C23C 14/32 (2006.01); C23C 14/50 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/345 (2013.01); C23C 14/325 (2013.01); C23C 14/505 (2013.01); H01J 37/32055 (2013.01); H01J 37/32669 (2013.01); H01J 37/34 (2013.01); H01J 37/3405 (2013.01);
Abstract

Provided is an arc evaporation source equipped with a target, a ring-shaped magnetic field guide magnet and a back side magnetic field generation source. The magnetic field guide magnet is aligned in a direction perpendicular to the evaporation face of the target and has a polarity that is the magnetization direction facing forward or backward. The back side magnetic field generation source is disposed at the rear of the magnetic field guide magnet, which is at the side of the back side of the target, and forms magnetic force lines running in the direction of magnetization of the magnetic field guide magnet. The target is disposed such that the evaporation face is positioned in front of the magnetic field guide magnet.


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