The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 14, 2017

Filed:

May. 09, 2016
Applicant:

Kingstone Semiconductor Limited Company, Shanghai, CN;

Inventors:

Jiong Chen, San Jose, CA (US);

Junhua Hong, Shanghai, CN;

Jin Zhang, Shanghai, CN;

Jeff Boeker, Shanghai, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 49/00 (2006.01); H01J 37/147 (2006.01); H01J 49/06 (2006.01); H01J 37/317 (2006.01); H01J 37/30 (2006.01);
U.S. Cl.
CPC ...
H01J 37/147 (2013.01); H01J 37/3007 (2013.01); H01J 37/3171 (2013.01); H01J 49/06 (2013.01); H01J 2237/10 (2013.01); H01J 2237/15 (2013.01);
Abstract

A beam current transmission system and method are disclosed. The beam current transmission system comprises an extraction device, a mass analyzer, a divergent element, a collimation element and a speed change and turning element, wherein an analysis plane of the mass analyzer is perpendicular to a convergent plane of the extracted beam, and after entering an entrance, the beam is converged on a convergent point in a plane perpendicular to the analysis plane, and then is diverged from the convergent point and transmitted to the divergent element from an exit; the collimation element is used for parallelizing the beam in a transmission plane of the beam; and the speed change and turning element is used for enabling the beam to change speed so as to achieve a target energy while the beam is deflected so that the transmission direction of the beam changes by a first pre-set angle. Through the coordinated cooperation among a plurality of beam current optical elements, a relatively wider distribution can be formed in a vertical plane, so the invention is suitable to the processing of a wafer with a large size and also ensure better injection uniformity on the premise of avoiding energy contamination.


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