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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9817499 B1

PDFFull Text
Date of Patent:
Nov. 14, 2017

Filed:

May. 03, 2016

Conductive pattern formation method, conductive pattern-bearing substrate, and touch panel sensor

Applicant:

Hitachi Chemical Company, Ltd., Tokyo, JP;

Inventors:

Hiroshi Yamazaki, Hitachi, JP;

Yoshimi Igarashi, Hitachi, JP;

Assignee:

HITACHI CHEMICAL COMPANY, LTD., Tokyo, JP;

Attorney:

Fitch, Even, Tabin & Flannery LLP

Primary Examiner:

Evan Pert

Int. Cl.
CPC ...
G06F 3/041 (2006.01); H05K 1/09 (2006.01); H05K 3/06 (2006.01); G06F 3/044 (2006.01); G03F 7/027 (2006.01); G03F 7/09 (2006.01); G03F 7/095 (2006.01); G03F 7/20 (2006.01); G03F 7/00 (2006.01); H05K 1/03 (2006.01); H05K 1/02 (2006.01);
U.S. Cl.
CPC ...
G06F 3/041 (2013.01); G03F 7/0005 (2013.01); G03F 7/027 (2013.01); G03F 7/09 (2013.01); G03F 7/092 (2013.01); G03F 7/095 (2013.01); G03F 7/0952 (2013.01); G03F 7/0955 (2013.01); G03F 7/2022 (2013.01); G06F 3/044 (2013.01); H05K 1/0274 (2013.01); H05K 1/036 (2013.01); H05K 1/0313 (2013.01); H05K 1/09 (2013.01); H05K 3/06 (2013.01); G06F 2203/04112 (2013.01); H05K 2201/0275 (2013.01); Y10T 428/24802 (2015.01);
Abstract

A conductive pattern formation method of the present invention includes a first exposure step of radiating active light in a patterned manner to a photosensitive layer including a photosensitive resin layer provided on a substrate and a conductive film provided on a surface of the photosensitive resin layer on a side opposite to the substrate; a second exposure step of radiating active light, in the presence of oxygen, to some or all of the portions of the photosensitive layer not exposed at least in the first exposure step; and a development step of developing the photosensitive layer to form a conductive pattern following the second exposure step.

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