The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 14, 2017
Filed:
Jun. 09, 2016
Applicant:
Raytheon Company, Waltham, MA (US);
Inventor:
Rigel Q. Woida-O'Brien, Tucson, AZ (US);
Assignee:
RAYTHEON COMPANY, Waltham, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03H 1/26 (2006.01); G03H 1/08 (2006.01); G03H 1/02 (2006.01); G03H 1/22 (2006.01); G02B 26/08 (2006.01); G02B 27/09 (2006.01);
U.S. Cl.
CPC ...
G03H 1/2645 (2013.01); G02B 26/0833 (2013.01); G02B 27/0944 (2013.01); G03H 1/02 (2013.01); G03H 1/0866 (2013.01); G03H 1/2286 (2013.01); G03H 1/2294 (2013.01); G03H 1/26 (2013.01); G03H 2001/0224 (2013.01); G03H 2001/264 (2013.01); G03H 2001/2655 (2013.01); G03H 2222/16 (2013.01); G03H 2225/24 (2013.01); G03H 2240/42 (2013.01);
Abstract
Embodiments are directed to an apparatus for creating a scene comprising: a plurality of micro-mirrors configured to rotate between an off position and at least two on positions to generate a plurality of holograms, and a processor configured to select positions for the micro-mirrors based on an input specification of the scene.