The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 14, 2017

Filed:

Oct. 14, 2014
Applicant:

AZ Electronic Materials (Luxembourg) S.a.r.l., Luxembourg, LU;

Inventors:

Naofumi Yoshida, Kakegawa, JP;

Yuji Tashiro, Kakegawa, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/075 (2006.01); G03F 7/40 (2006.01); G03F 7/38 (2006.01); G03F 7/30 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); C09D 183/14 (2006.01); C08L 83/14 (2006.01); C08G 77/52 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0757 (2013.01); C08L 83/14 (2013.01); C09D 183/14 (2013.01); G03F 7/162 (2013.01); G03F 7/20 (2013.01); G03F 7/30 (2013.01); G03F 7/322 (2013.01); G03F 7/38 (2013.01); G03F 7/40 (2013.01); C08G 77/52 (2013.01);
Abstract

A heat- or photo-curable composition comprising: a polysiloxane which is produced by reacting a silicon compound (i) represented by the formula: RSi(X)(wherein Rrepresents an alkyl group, an aryl group or the like; X represents a chlorine atom or an alkoxy group; and n represents 0 to 2) with a silicon compound (ii) represented by the formula (b) or (c) (wherein Rto Rindependently represent an alkyl group or the like; Mand Mindependently represent an arylene group, an alkylene group or the like; and Yto Yindependently represent a chlorine atom or an alkoxy group) in the presence of an alkali catalyst or an acid catalyst; a polymerization initiator which enables the generation of an acid or a base by the action of heat or light; and a solvent. The composition enables the formation of a thick film. When the composition is coated onto a substrate, is then heated or exposed to light, is then developed if necessary, and is then heated and cured at a low temperature, a cured film can be formed.


Find Patent Forward Citations

Loading…