The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 14, 2017

Filed:

Mar. 20, 2012
Applicants:

Sandeep Krishnan, Princeton, NJ (US);

Keng Moy, Basking Ridge, NJ (US);

Alexander I. Gurary, Bridgewater, NJ (US);

Matthew King, Montville, NJ (US);

Vadim Boguslavskiy, Princeton, NJ (US);

Steven Krommenhoek, Annandale, NJ (US);

Inventors:

Sandeep Krishnan, Princeton, NJ (US);

Keng Moy, Basking Ridge, NJ (US);

Alexander I. Gurary, Bridgewater, NJ (US);

Matthew King, Montville, NJ (US);

Vadim Boguslavskiy, Princeton, NJ (US);

Steven Krommenhoek, Annandale, NJ (US);

Assignee:

Veeco Instruments Inc., Plainview, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/458 (2006.01); C23C 16/46 (2006.01); H01L 21/67 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4584 (2013.01); C23C 16/4586 (2013.01); C23C 16/46 (2013.01); H01L 21/6719 (2013.01); H01L 21/68764 (2013.01); H01L 21/68771 (2013.01); H01L 21/68792 (2013.01);
Abstract

A structure for a chemical vapor deposition reactor desirably includes a reaction chamber having an interior, a spindle mounted in the reaction chamber, and a wafer carrier releasably mounted onto the spindle for rotation therewith. The spindle desirably has a shaft extending along a vertical rotational axis and a key projecting outwardly from the shaft. The wafer carrier preferably has a body defining oppositely-facing top and bottom surfaces and at least one wafer-holding feature configured so that a wafer can be held therein with a surface of the wafer exposed at the top surface of the body. The wafer carrier desirably further has a recess extending into the body from the bottom surface of the body and a keyway projecting outwardly from a periphery of the recess along a first transverse axis. The shaft preferably is engaged in the recess and the key preferably is engaged into the keyway.


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