The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 07, 2017

Filed:

May. 28, 2015
Applicant:

Semiconductor Components Industries, Llc, Phoenix, AZ (US);

Inventors:

Raminda Madurawe, Sunnyvale, CA (US);

Hamid Soleimani, Cupertino, CA (US);

Irfan Rahim, Milpitas, CA (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 29/66 (2006.01); H01L 29/423 (2006.01); H01L 29/417 (2006.01); H01L 29/786 (2006.01); H01L 29/06 (2006.01); H01L 21/84 (2006.01); H01L 27/12 (2006.01); H01L 23/48 (2006.01); H01L 27/146 (2006.01);
U.S. Cl.
CPC ...
H01L 29/66742 (2013.01); H01L 21/84 (2013.01); H01L 23/481 (2013.01); H01L 27/12 (2013.01); H01L 27/1463 (2013.01); H01L 27/1469 (2013.01); H01L 27/14612 (2013.01); H01L 27/14616 (2013.01); H01L 27/14634 (2013.01); H01L 27/14689 (2013.01); H01L 29/0649 (2013.01); H01L 29/41733 (2013.01); H01L 29/42384 (2013.01); H01L 29/78696 (2013.01); H01L 27/1464 (2013.01); H01L 2029/42388 (2013.01);
Abstract

An integrated circuit die may include bottom-gate thin-body transistors. The bottom-gate thin-body transistors may be formed in a thinned-down substrate having a thickness that is defined by shallow trench isolation structures that provide complete well isolation for the transistors. The transistors may include gate terminal contacts formed through the shallow trench isolation structures, bulk terminal contacts that are formed through the thinned substrate and that overlap with the gate contacts, and source-drain terminal contacts with in-situ salicide. Additional metallization layers may be formed over the gate/bulk/source-drain contacts after bonding.


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