The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 07, 2017
Filed:
Mar. 02, 2016
Samsung Display Co., Ltd., Yongin-si, Gyeonggi-Do, KR;
Hongro Lee, Yongin-si, KR;
Chunghwan Lee, Yongin-si, KR;
SAMSUNG DISPLAY CO., LTD., Yongon-Si, Gyeonggi-Do, KR;
Abstract
A laser annealing apparatus includes a substrate supporter that receives a substrate having an amorphous silicon layer, a laser beam irradiation unit that irradiates a line laser beam onto the substrate disposed on the substrate supporter, and a substrate transport unit that moves the substrate supporter in the first direction and in a second direction crossing the first direction and rotates the substrate supporter within a first plane defined by the first direction and the second direction. The substrate transport unit rotates the substrate supporter by an angle θ less than about 90 degrees within the first plane and moves the substrate supporter both in the first direction and in the second direction at substantially the same time. The laser beam irradiation unit irradiates the line laser beam multiple times onto the substrate disposed on the substrate supporter while the substrate transport unit moves the substrate supporter.