The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 07, 2017
Filed:
Mar. 23, 2016
Applicant:
Soitec, Bernin, FR;
Inventor:
Thierry Barge, Chevrieres, FR;
Assignee:
Soitec, Bernin, FR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/20 (2006.01); H01L 21/263 (2006.01); H01L 21/86 (2006.01); H01L 21/762 (2006.01); H01L 29/06 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/86 (2013.01); H01L 21/02046 (2013.01); H01L 21/2011 (2013.01); H01L 21/263 (2013.01); H01L 21/76251 (2013.01); H01L 29/0649 (2013.01);
Abstract
The present disclosure relates to a method for reducing metal contamination on a surface of a substrate. The method involves plasma treatment of the surface of the substrate by ion bombardment, wherein a plasma of a supplied gas is generated, and a bombardment energy of the ions in the plasma is controlled by a radio frequency electromagnetic field. The bombardment energy of the ions is higher than a first threshold so as to tear the metal contamination from the surface of the substrate, and the bombardment energy of the ions is lower than a second threshold so as to prevent a surface quality degradation of the surface of the substrate.