The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 07, 2017
Filed:
Jul. 05, 2013
Applicant:
Canon Kabushiki Kaisha, Tokyo, JP;
Inventor:
Shinichi Hirano, Utsunomiya, JP;
Assignee:
CANON KABUSHIKI KAISHA, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/58 (2006.01); G03B 27/52 (2006.01); G03B 27/60 (2006.01); G03B 27/32 (2006.01); G03F 7/20 (2006.01); G03B 27/42 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70733 (2013.01); G03F 7/7075 (2013.01); G03F 7/70691 (2013.01); G03F 7/70725 (2013.01); G03F 7/70783 (2013.01);
Abstract
The present invention provides an exposure apparatus which transfers a pattern of a reticle onto a substrate, the apparatus including a convey unit configured to convey the substrate while chucking and holding a lower surface of the substrate, and a control unit configured to control a conveyance condition of the convey unit so that a conveyance acceleration is lower when the convey unit conveys the substrate in a vertical direction with downward acceleration than when the convey unit conveys the substrate in the vertical direction with upward acceleration.