The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 07, 2017

Filed:

Mar. 26, 2015
Applicant:

The Board of Trustees of the Leland Stanford Junior University, Palo Alto, CA (US);

Inventors:

Adam S. Backer, Palo Alto, CA (US);

Mikael P. Backlund, Palo Alto, CA (US);

Alexander R. von Diezmann, Palo Alto, CA (US);

Steffen J. Sahl, Göttingen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 21/16 (2006.01); G02B 21/02 (2006.01); G02B 21/36 (2006.01); G01B 11/22 (2006.01); G02B 21/00 (2006.01);
U.S. Cl.
CPC ...
G02B 21/16 (2013.01); G01B 11/22 (2013.01); G02B 21/0016 (2013.01); G02B 21/02 (2013.01); G02B 21/361 (2013.01);
Abstract

Various imaging apparatuses, methods and their implementation are characterized herein. As may be implemented with one or more embodiments, a phase mask and optics operate to provide characterization of object depth and related rotational mobility of a feature corresponding to the object. In various implementations, the optics include a microscope having an objective and a detection pathway that operate with the phase mask for passing the light from the objective. Circuitry, such as light detector, processor or combination thereof operates with the phase mask and microscope to characterize the depth and rotational mobility, based on detected light passed via the microscope and the phase mask.


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