The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 07, 2017
Filed:
Jun. 14, 2016
Huazhong University of Science and Technology, Wuhan, Hubei, CN;
Lianbo Guo, Hubei, CN;
Jiaming Li, Hubei, CN;
Xiangyou Li, Hubei, CN;
Xiaoyan Zeng, Hubei, CN;
Yongfeng Lu, Hubei, CN;
Rongxing Yi, Hubei, CN;
Xinyan Yang, Hubei, CN;
Zhongqi Hao, Hubei, CN;
Huazhong University of Science and Technology, Wuhan, Hubei, CN;
Abstract
Provided is a method for inhibiting self-absorption effect of a LIBS, comprising ablating a to-be-measured sample via a pulse laser thereby generating plasma, and selectively stimulating the plasma using a wavelength-tunable laser beam enabling transition of particles in a ground-state in the plasma to high energy state as stimulated absorption, thereby improving a stimulated absorption transition efficiency of the particles in a ground-state, and preventing plasma spectrum from being influenced by self-absorption effect. The invention is capable of eliminating the self-absorption effect without introducing external interference, obtaining original characteristics of emission spectrum from the center of the plasma, and essentially inhibiting and finally eliminating the self-absorption effect of laser plasma by making use of intrinsic physical property of plasma.