The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9809882 B1

PDF
Full Text
Expired
Date of Patent:
Nov. 07, 2017

Filed:

Jan. 14, 2015
Applicant:

National Institute of Standards and Technology, Gaithersburg, MD (US);

Inventor:

Owen Hildreth, Pacific Grove, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/285 (2006.01); H01L 21/306 (2006.01); C23C 18/18 (2006.01); C23C 18/16 (2006.01); C23C 18/31 (2006.01); H01Q 17/00 (2006.01); C25F 3/12 (2006.01);
U.S. Cl.
CPC ...
C23C 18/1608 (2013.01); C23C 18/1879 (2013.01); C23C 18/31 (2013.01); C25F 3/12 (2013.01); H01L 21/28506 (2013.01); H01L 21/306 (2013.01); H01Q 17/00 (2013.01);
Abstract

A process for depositing a metal includes disposing an activating catalyst on a substrate; contacting the activating catalyst with a metal cation from a vapor deposition composition; contacting the substrate with a reducing anion from the vapor deposition composition; performing an oxidation-reduction reaction between the metal cation and the reducing anion in a presence of the activating catalyst; and forming a metal from the metal cation to deposit the metal on the substrate. A system for depositing a metal includes an activating catalyst to deposit on a substrate; and a primary reagent to form: a metal cation to deposit on the substrate as a metal; and a reducing anion to provide electrons to the activating catalyst, the metal cation, the substrate, or a combination thereof, wherein the primary reagent forms the metal cation and the reducing anion in response to being subjected to a dissociating condition.


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Hildreth, Owen. (2017). Article and process for selective deposition (U.S. Patent No. 9809882). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9809882

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