The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 07, 2017

Filed:

Jul. 28, 2014
Applicant:

Samsung Display Co. Ltd., Yongin, Gyeonggi-Do, KR;

Inventors:

Choel Min Jang, Seoul, KR;

In Kyo Kim, Seongnam-si, KR;

Suk Won Jung, Seoul, KR;

Myung Soo Huh, Suwon-si, KR;

Assignee:

SAMSUNG DISPLAY CO. LTD., Gyeonggi-Do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); C23C 16/44 (2006.01); C23C 16/455 (2006.01); C23C 16/54 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45546 (2013.01); C23C 16/45502 (2013.01); C23C 16/45527 (2013.01); C23C 16/45548 (2013.01); C23C 16/45578 (2013.01); C23C 16/545 (2013.01);
Abstract

An atomic layer deposition apparatus includes a first base plate on which a seat portion is defined to allow a substrate to be seated thereon, a second base plate disposed opposite to the first base plate, a first gas nozzle portion arranged on the second base plate, a second gas nozzle portion arranged on the second base plate to be spaced apart from the first gas nozzle portion and substantially parallel to the first gas nozzle portion, and a gas storage portion connected to the first gas nozzle portion and the second gas nozzle portion.


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