The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 07, 2017
Filed:
Jan. 13, 2014
Applicant:
Centre Luxembourgeois DE Recherches Pour Le Verre ET LA Ceramique (C.r.v.c) Sarl, Dudelange, LU;
Inventors:
Gilbert Galan, Dudelange, LU;
Jean-Philippe Uselding, Habay-la-Neuve, BE;
Guy Comans, Neufchateau, BE;
Marcel Schloremberg, Habay-la-Neuve, BE;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/34 (2006.01); H01J 37/34 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
C23C 14/34 (2013.01); H01J 37/32816 (2013.01); H01J 37/342 (2013.01); H01J 37/3405 (2013.01); H01J 37/3411 (2013.01); H01J 37/3417 (2013.01); H01J 37/3435 (2013.01); H01J 37/3497 (2013.01); H01J 2237/332 (2013.01);
Abstract
An endblock for a rotatable sputtering target, such as a rotatable magnetron sputtering target, is provided. A sputtering apparatus, including one or more such endblock(s), includes locating the electrical contact(s) (e.g., brush(es)) between the collector and rotor in the endblock(s) in an area under vacuum (as opposed to in an area at atmospheric pressure).