The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 07, 2017
Filed:
Jun. 21, 2016
Applicant:
Panasonic Intellectual Property Management Co., Ltd., Osaka, JP;
Inventors:
Miyuki Nakai, Osaka, JP;
Satoshi Shibata, Osaka, JP;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); C03C 17/22 (2006.01); C23C 16/30 (2006.01); C23C 16/455 (2006.01); H01M 10/0525 (2010.01); H01M 10/0562 (2010.01);
U.S. Cl.
CPC ...
C03C 17/22 (2013.01); C23C 16/308 (2013.01); C23C 16/45527 (2013.01); C03C 2217/28 (2013.01); C03C 2218/152 (2013.01); H01M 10/0525 (2013.01); H01M 10/0562 (2013.01);
Abstract
A method for producing an oxynitride film includes: (A) supplying a first precursor containing a network former into a reactor in which a substrate is placed; (B) supplying at least one of an oxygen gas and an ozone gas into the reactor; (C) supplying a second precursor containing at least one of an alkali metal element and an alkaline-earth metal element into the reactor; (D) supplying at least one of a nitrogen gas and an ammonia gas into the reactor; and (E) supplying a purge gas into the reactor.