The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 07, 2017

Filed:

Sep. 26, 2016
Applicant:

Oce-technologies B.v., Venlo, NL;

Inventors:

Guido G. Willems, Venlo, NL;

Hermanus M. Kuypers, Venlo, NL;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41F 23/00 (2006.01); B41J 11/00 (2006.01); H05H 1/24 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
B41J 11/002 (2013.01); B41F 23/00 (2013.01); B41J 11/0015 (2013.01); H01J 37/32568 (2013.01); H01J 37/32761 (2013.01); H01J 37/32798 (2013.01); H05H 1/2406 (2013.01); H01J 2237/002 (2013.01); H05H 2001/2412 (2013.01);
Abstract

A plasma generating device includes a first plasma electrode and a counter electrode facing each other. The first plasma electrode extends in a lateral direction and includes two projections. Each of the two projections protrudes from the first plasma electrode in the direction of the counter electrode over a predetermined distance. The plasma generating device further includes a preload mechanism adapted for urging each of said two projections of the first plasma electrode against the counter electrode. The two projections cooperatively define a plasma gap between the first plasma electrode and the counter electrode. The counter electrode includes a support surface facing said plasma gap. The support surface is substantially flat along the plasma gap.


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