The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 07, 2017
Filed:
Jun. 22, 2012
Yoshihito Kobayashi, Tokyo, JP;
Masamitsu Itoh, Tokyo, JP;
Taro Inada, Shibukawa, JP;
Jun Watanabe, Tokyo, JP;
Yoshihito Kobayashi, Tokyo, JP;
Masamitsu Itoh, Tokyo, JP;
Taro Inada, Shibukawa, JP;
Jun Watanabe, Tokyo, JP;
Toshiba Memory Corporation, Tokyo, JP;
Abstract
There is provided a reticle chuck cleaner A for cleaning a reticle chuck of an apparatus, as a reticle chuck cleaner that allows easy cleaning of a reticle chuck in a vacuum chamber of an apparatus without exposing the chamber to the atmosphere and contributes to improvement of the operating ratio of the apparatus, including: an adhesive layerto be adhered to a chuck region of the reticle chuck; a support layerlaminated on the adhesive layer; and a substratehaving a shape capable of being carried to the reticle chuck, the support layerand the substratebeing partially bonded together in an adhesive regionof a partial adhesive layer