The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 31, 2017
Filed:
Mar. 15, 2013
Applicants:
Centrotherm Thermal Solutions Gmbh & Co. KG, Blaubeuren, DE;
Hq-dielectrics Gmbh, Dornstadt, DE;
Inventors:
Assignee:
HQ-DIELECTRICS GMBH, , DE;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/66 (2006.01); H01L 21/67 (2006.01); G01J 5/00 (2006.01); H01L 21/324 (2006.01); G01J 5/10 (2006.01); G01J 5/08 (2006.01); G01J 5/02 (2006.01);
U.S. Cl.
CPC ...
H01L 22/10 (2013.01); G01J 5/0003 (2013.01); G01J 5/0007 (2013.01); G01J 5/0275 (2013.01); G01J 5/089 (2013.01); G01J 5/0862 (2013.01); G01J 5/10 (2013.01); H01L 21/324 (2013.01); H01L 21/67115 (2013.01); H01L 21/67248 (2013.01);
Abstract
An apparatus and a method for determining the temperature of a substrate, in particular of a semiconductor substrate during the heating thereof by means of at least one first radiation source are disclosed. A determination of the temperature is based on detecting first and second radiations, each comprising radiation emitted by the substrate due to its own temperature and radiation emitted by the first radiation, which is reflected at the substrate and at least one of a drive power of the first radiation source and the radiation intensity of the first radiation source.