The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 31, 2017

Filed:

Jan. 21, 2015
Applicants:

Masdar Institute of Science and Technology, Abu Dhabi, AE;

The Regents of the University of California, Oakland, CA (US);

Inventors:

Roseanne Warren, Berkeley, CA (US);

Firas Sammoura, San Jose, CA (US);

Liwei Lin, San Ramon, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01G 11/46 (2013.01); H01G 11/04 (2013.01); H01G 11/86 (2013.01); C25D 11/26 (2006.01); C25D 11/34 (2006.01); H01G 11/36 (2013.01);
U.S. Cl.
CPC ...
H01G 11/46 (2013.01); C25D 11/26 (2013.01); C25D 11/34 (2013.01); H01G 11/36 (2013.01); H01G 11/86 (2013.01); H01G 11/04 (2013.01); Y02E 60/13 (2013.01);
Abstract

A method to a fabricate high surface area, high performance supercapacitor includes include applying a metal layer to at least a portion of a nanostructure; after applying the metal layer, oxidizing the metal layer; applying a plurality of additional metal layers onto a previously oxidized metal layer; and after applying each additional metal layer, oxidizing the additional metal layer prior to applying a successive additional metal layer. The metal layers may include a composition comprising at least one metal, the at least one metal selected from the group consisting of ruthenium, titanium, manganese, vanadium, iron, tin, cobalt and nickel. Optionally, each of the additional metal layers may be applied using atomic layering deposition (ALD).


Find Patent Forward Citations

Loading…