The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 31, 2017
Filed:
Oct. 20, 2015
International Business Machines Corporation, Armonk, NY (US);
Ramon Bertran, Bronx, NY (US);
Pradip Bose, Yorktown Heights, NY (US);
Alper Buyuktosunoglu, White Plains, NY (US);
Timothy J. Slegel, Staatsburg, NY (US);
INTERNATIONAL BUSINESS MACHINES CORPORATION, Armonk, NY (US);
Abstract
An aspect includes pruning a design space when generating a maximum power stressmark. A multi-stage design space search process is performed. Each stage includes calculating a number of instructions per cycle (IPC) for each instruction sequence in a set of instruction sequences that place a power stress on a system under analysis, removing one or more of the instruction sequences having an IPC lower than a pruning threshold from the set, evaluating at least one power metric of the remaining instruction sequences in the set, removing one or more of the instruction sequences having at least one power metric evaluated outside of one or more pruning ranges from the set, and passing the remaining instruction sequences in the set to a next stage. A maximum power stressmark is generated based on the evaluating of the at least one power metric from a final stage.