The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 31, 2017

Filed:

Oct. 11, 2012
Applicant:

DE LA Rue International Limited, Basingstoke, GB;

Inventor:

Adam Lister, Andover, GB;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 7/38 (2006.01); G03C 5/08 (2006.01); G03C 5/60 (2006.01); B42D 25/41 (2014.01); B42D 25/42 (2014.01); B42D 25/29 (2014.01); B42D 25/342 (2014.01);
U.S. Cl.
CPC ...
G03F 7/38 (2013.01); B42D 25/29 (2014.10); B42D 25/41 (2014.10); B42D 25/42 (2014.10); G03C 5/08 (2013.01); G03C 5/60 (2013.01); G03F 7/2002 (2013.01); B42D 25/342 (2014.10); B42D 2033/10 (2013.01); B42D 2033/14 (2013.01); B42D 2033/20 (2013.01); B42D 2033/30 (2013.01); B42D 2035/16 (2013.01); B42D 2035/20 (2013.01); B42D 2035/26 (2013.01); B42D 2035/44 (2013.01);
Abstract

A method of manufacturing a security device including: conveying a substrate web including a photosensitive film along a transport path; exposing the photosensitive film to radiation of a predetermined wavelength through a mask, wherein the mask includes a predetermined pattern of regions which are substantially opaque to radiation of the predetermined wavelength and at least semi-transparent to radiation of the predetermined wavelength, respectively; during the exposure, moving the mask alongside the substrate web along at least a portion of the transport path at substantially the same speed as the substrate web, such that there is substantially no relative movement between the mask and the substrate web; and heating the substrate web including the exposed photosensitive film. In this way, regions of the photosensitive film exposed to the radiation of the predetermined wavelength undergo an increase in optical density such that the photosensitive film displays a reproduction of the predetermined pattern.


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