The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 31, 2017
Filed:
Dec. 29, 2015
Applicant:
Shanghai Ruiyu Biotech Co., Ltd., Shanghai, CN;
Assignee:
SHANGHAI RUIYU BIOTECH CO., LTD., Shanghai, CN;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 21/26 (2006.01); G02B 21/00 (2006.01); G02B 21/24 (2006.01); G02B 21/36 (2006.01); G02B 25/00 (2006.01);
U.S. Cl.
CPC ...
G02B 21/26 (2013.01); G02B 21/00 (2013.01); G02B 21/0008 (2013.01); G02B 21/241 (2013.01); G02B 21/362 (2013.01); G02B 25/005 (2013.01);
Abstract
A follow-up fixed focus system includes a fixed focus device, and the second end of the fixed focus device is in contact with a sample plate; when the sample plate has a small protrusion, the second end of the fixed focus device is pushed by the protrusion of the sample plate. When the sample plate has a small depression, the second end of the fixed focus device is in contact with the sample plate all the time under the action of self gravity of an observation device, so that the imaging distance between an object lens and the sample plate is kept unchanged.