The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 31, 2017

Filed:

Dec. 06, 2012
Applicant:

Dow Global Technologies Llc, Midland, MI (US);

Inventors:

Yi Ping Zhu, Shanghai, CN;

Bing Liang, Shanghai, CN;

Andong Liu, Shanghai, CN;

Wanglin Yu, Pearland, TX (US);

Assignee:

Dow Global Technologies LLC, Midland, MI (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09K 3/14 (2006.01); C10M 165/00 (2006.01); B28D 5/00 (2006.01); C10M 173/02 (2006.01);
U.S. Cl.
CPC ...
C10M 165/00 (2013.01); B28D 5/0076 (2013.01); C10M 173/02 (2013.01); C10M 2207/127 (2013.01); C10M 2209/103 (2013.01); C10M 2209/104 (2013.01); C10N 2220/14 (2013.01); C10N 2230/04 (2013.01); C10N 2240/401 (2013.01);
Abstract

A water-based cutting fluid that comprises water and a water-soluble polyalkylene glycol (PAG) having cloud point from 30° C. to 80° C. The cutting fluid is water-based, i.e., it comprises at least 50 percent by weight (wt %) water. The cutting fluids are well suited for use with diamond wiresaws for the cutting of silicon ingots. The fluids exhibit one or more of low hydrogen generation, no wafer cleaning issues, good lubricity, good cooling efficiency, good swarf suspension and dispersion, low foaming, are generally non-sensitive to metal ions, and are nonflammable.


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